Carbonに研究成果が掲載されました

Modulation of the electronic state of carbon thin films by inorganic substrates

https://www.sciencedirect.com/science/article/pii/S0008622322003578?via%3Dihub

The control of the electronic states of carbon-based materials is of great importance for the widespread use of carbon materials as electronic devices and catalysts. This article reports a novel method of controlling the electronic states of carbon-based materials by establishing covalent bonds between inorganic support materials and carbon thin films. Carbon thin films of 1 nm thickness were grown on inorganic substrates (Al₂O₃, AlN, and ZrO₂) using chemical vapor deposition. Covalent bond formation was confirmed between the substrates and the carbon films. The investigations of field effect transistor characteristics and work function revealed the different relationships between the Dirac points and Fermi levels of carbon films depending on the type of substrate. The Fermi level of the films grown on Al₂O₃ or ZrO₂ was found to be lower than the Dirac point energy level, with the ZrO₂ sample exhibiting the lowest Fermi level. In contrast, the Fermi level of the film grown on AlN was located at a higher energy than the Dirac point. The Fermi level of the carbon film depends on the inorganic substrate, and the change in the Fermi level can be explained by the nature of the covalent bonds between the substrate and the film.